3M™ CMP Pad Conditioner Brush

  • 3M ID B5005035336

Durable brush bristles assist with removal of pad debris from microreplicated, porometric and felt-based pads

Easy connection to polishing tool end effector

Exclusive polymer substrate enhances corrosion resistance

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Details

Highlights
  • Durable brush bristles assist with removal of pad debris from microreplicated, porometric and felt-based pads
  • Easy connection to polishing tool end effector
  • Exclusive polymer substrate enhances corrosion resistance
  • Efficient pad cleaning and slurry distribution helps enable low cost of ownership
  • 3M™ CMP brush connects easily to polishing tool end effector
  • Designed for semiconductor grade CMP processes

Engineered CMP pad conditioner brushes are designed for critical semiconductor buff CMP applications.

  • green CMP pad conditioner brush close up

    Excellent for use with soft CMP pads

    Strong, durable bristles are independently anchored and evenly distributed across the 3M brush surface, making the 3M brush ideal for removing pad debris from soft microreplicated, porometric and felt-based CMP pads. Bristles are made from an exclusive polymer that resists corrosion much better than metal. The polycarbonate carrier features a universal mounting configuration, making for easy connection to a wide range of polishing tools and effectors.

Specifications

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